Integrated circuit field effect transistors including...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S308000, C257S328000, C257SE21438, C257SE21442

Reexamination Certificate

active

07122871

ABSTRACT:
Integrated circuit field effect transistors include an integrated circuit substrate and a fin that projects away from the integrated circuit substrate, extends along the integrated circuit substrate, and includes a top that is remote from the integrated circuit substrate. A channel region is provided in the fin that is doped a conductivity type and has a higher doping concentration of the conductivity type adjacent the top than remote from the top. A source region and a drain region are provided in the fin on opposite sides of the channel region, and an insulated gate electrode extends across the fin adjacent the channel region. Related fabrication methods also are described.

REFERENCES:
patent: 5428237 (1995-06-01), Yuzurihara et al.
patent: 5844278 (1998-12-01), Mizuno et al.
patent: 6525403 (2003-02-01), Inaba et al.
patent: 2004/0126969 (2004-07-01), Brown et al.
patent: 2004/0217433 (2004-11-01), Yeo et al.

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