Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2006-04-25
2006-04-25
Cao, Phat X. (Department: 2814)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S368000, C257S369000
Reexamination Certificate
active
07034365
ABSTRACT:
Integrated circuit devices are provided including an integrated circuit substrate and first, second and third spaced apart insulating regions in the integrated circuit substrate that define first and second active regions. A first gate electrode is provided on the first active region. The first gate electrode has a first portion on the first active region that extends onto the first insulating region and a second portion at an end of the first portion on the first insulating region. A second gate electrode is provided on the second active region. An insulating layer is provided on the first, second and third active regions defining a first gate contact hole that exposes at least a portion of the second portion of the first gate electrode. The first gate electrode is free of a gate contact hole on the first portion of the first gate electrode. A second gate contact hole is provided on the second active region that exposes at least a portion of the second gate electrode. Related methods of fabricating integrated circuit devices are also provided.
REFERENCES:
patent: 6223331 (2001-04-01), Juengling
patent: 6313508 (2001-11-01), Kobayashi
patent: 6815771 (2004-11-01), Kimura
Cho Myoung-Kwan
Park Jeung-Hwan
Cao Phat X.
Myers Bigel & Sibley & Sajovec
Samsung Electronics Co,. Ltd.
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