Integrated circuit and method of fabrication thereof

Details Integrated circuit and method of fabrication thereof Integrated circuit and method of fabrication thereof

2007-11-29

2011-11-15

Smith, Matthew (Department: 2823)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S233000, C257S296000, C257S327000, C257S311000

Reexamination Certificate

active

08058123

ABSTRACT:
A method of forming an integrated circuit structure comprising the steps of forming a first and second device region on a surface of a wafer, forming a spacer of a first width on a sidewall of a first gate stack in the first device region, forming a spacer of a second width on a sidewall of a second gate stack in the second device region, with the first width being different from the second width.

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