Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2005-03-22
2005-03-22
Thomas, Tom (Department: 2815)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S650000, C438S663000, C427S126500
Reexamination Certificate
active
06869877
ABSTRACT:
A capacitor for a memory device is formed with a conductive oxide for a bottom electrode. The conductive oxide (RuOx) is deposited under low temperatures as an amorphous film. As a result, the film is conformally deposited over a three dimensional, folding structure. Furthermore, a subsequent polishing step is easily performed on the amorphous film, increasing wafer throughput. After deposition and polishing, the film is crystallized in a non-oxidizing ambient.
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Basceri Cem
Cummings Steve
Gealy Dan
Graettinger Tom
Rhodes Howard E.
Diaz José R.
Knobbe Martens Olson & Bear LLP
Micro)n Technology, Inc.
Thomas Tom
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