Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports
Reexamination Certificate
2007-10-09
2009-10-13
Berman, Jack I (Department: 2881)
Radiant energy
Inspection of solids or liquids by charged particles
Analyte supports
Reexamination Certificate
active
07601972
ABSTRACT:
An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical system and introduced through a secondary optical system to a detector. Irradiation of the charged particles is conducted while moving the sample. Irradiation spots of the charged particles are arranged by N rows along a moving direction of the sample and by M columns along a direction perpendicular thereto. Every row of the irradiation spots of the charged particles is shifted successively by a predetermined amount in a direction perpendicular to the moving direction of the sample.
REFERENCES:
patent: 4607167 (1986-08-01), Petric
patent: 4911103 (1990-03-01), Davis et al.
patent: 4912052 (1990-03-01), Miyoshi et al.
patent: 4944645 (1990-07-01), Suzuki
patent: 4954705 (1990-09-01), Brunner et al.
patent: 5359197 (1994-10-01), Komatsu et al.
patent: 5362968 (1994-11-01), Miyoshi et al.
patent: 5412210 (1995-05-01), Todokoro et al.
patent: 5422486 (1995-06-01), Herrmann et al.
patent: 5430292 (1995-07-01), Honjo et al.
patent: 5493116 (1996-02-01), Toro-Lira et al.
patent: 5747819 (1998-05-01), Nakasuji et al.
patent: 5751538 (1998-05-01), Nakasuji
patent: 5763893 (1998-06-01), Nakasuji
patent: 5770863 (1998-06-01), Nakasuji
patent: 5892224 (1999-04-01), Nakasuji
patent: 5981947 (1999-11-01), Nakasuji et al.
patent: 5994704 (1999-11-01), Nakasuji
patent: 6087667 (2000-07-01), Nakasuji et al.
patent: 6125522 (2000-10-01), Nakasuji
patent: 6344750 (2002-02-01), Lo et al.
patent: 6509569 (2003-01-01), Frosien
patent: 6603130 (2003-08-01), Bisschops et al.
patent: 6614026 (2003-09-01), Adamec
patent: 7022986 (2006-04-01), Shinada et al.
patent: 2006/0102838 (2006-05-01), Nakasuji et al.
patent: 52-115161 (1977-09-01), None
patent: 52-117567 (1977-10-01), None
patent: 57-072326 (1982-05-01), None
patent: 57-125871 (1982-08-01), None
patent: 60-000741 (1985-01-01), None
patent: 61-239624 (1986-10-01), None
patent: 62-100936 (1987-05-01), None
patent: 62-195838 (1987-08-01), None
patent: 03-022339 (1991-01-01), None
patent: 03-053439 (1991-03-01), None
patent: 03-102814 (1991-04-01), None
patent: 03-266350 (1991-11-01), None
patent: 03-276548 (1991-12-01), None
patent: 04-266350 (1992-09-01), None
patent: 05-063261 (1993-03-01), None
patent: 05-251316 (1993-09-01), None
patent: 07-065766 (1995-03-01), None
patent: 08-138611 (1996-05-01), None
patent: 09-073872 (1997-03-01), None
patent: 09-311112 (1997-12-01), None
patent: 10-062503 (1998-03-01), None
patent: 10-073424 (1998-03-01), None
patent: 10-125271 (1998-05-01), None
patent: 10-177952 (1998-06-01), None
patent: 11-132975 (1999-05-01), None
patent: 11-233062 (1999-08-01), None
patent: 2000-003692 (2000-01-01), None
patent: 2000-67798 (2000-03-01), None
patent: 2000-090868 (2000-03-01), None
patent: 2000-100369 (2000-04-01), None
patent: 2000-133565 (2000-05-01), None
patent: 2000-149843 (2000-05-01), None
Low Voltage and high speed operating electrostatic wafer chuck using sputtered tantalum oxide membrane, Mamoru Nakasuji et al., J. Vac. Sci. Technol. A 12(5), Sep./Oct. 1994, American Vacuum Society pp. 2834-2839.
High-Emittance and Low-Brightness Electron Gun for reducing-Image Projection System: Computer Simulation, Mamoru Nakasuji et al., Jpn. J. Appl. Phys. vol. 36 (1997) pp. 2404-2408.
H. Hayashi et al., LSI Testing Symposium 1998, Minutes of the meeting, p. 160 (1998) (partial translation).
Multi-Beam Concepts for Nanometer Devices, B. Lischke et al., Japanese Journal of Applied Physics, vol. 28, No. 10, Oct. 1989, pp. 2058-2064.
An electron-beam inspecting system for x-ray mask production, P. Sandland et al., J. Vac. Sci. Technol. B9 (6), Nov./Dec. 1991, American Vacuum Society, pp. 3005-3009.
Requirements and performance of an electron-beam column designed for x-ray mask inspection, W.D. Meisburger et al., J Vac. Sci. Technol. B9 (6), Nov./Dec. 1991, American Vacuum Society, pp. 3010-3014.
Hamashima Muneki
Karimata Tsutomu
Kimba Toshifumi
Nakasuji Mamoru
Noji Nobuharu
Berman Jack I
Ebara Corporation
Westerman, Hattori, Daniels & Adrian , LLP.
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