Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2011-01-11
2011-01-11
Nguyen, Sang (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S609000, C356S624000, C250S201400
Reexamination Certificate
active
07869022
ABSTRACT:
A scatterometer has a focus sensor arranged to detect whether the target being measured is in a correct focal plane. A modulation is applied to a component of the focus sensor or the scatterometer such that a defocus as measured by the focus sensor varies according to a certain function. From knowledge of the modulation, the gain of the sensor can be calibrated.
REFERENCES:
patent: 4435055 (1984-03-01), Berdat et al.
patent: 4475182 (1984-10-01), Hosaka
patent: 4866262 (1989-09-01), van der Werf et al.
patent: 5134298 (1992-07-01), Inagaki et al.
patent: 5187696 (1993-02-01), Ishii et al.
patent: 5191200 (1993-03-01), van der Werf et al.
patent: 5251194 (1993-10-01), Yoshimoto et al.
patent: 5673101 (1997-09-01), Tenner et al.
patent: 5696589 (1997-12-01), Bernacki
patent: 5801832 (1998-09-01), Van Den Brink
patent: 5926266 (1999-07-01), Dorundo et al.
patent: 5978091 (1999-11-01), Jann et al.
patent: 6115345 (2000-09-01), Kato et al.
patent: 6458605 (2002-10-01), Stirton
patent: 6596984 (2003-07-01), Vrehen
patent: 6690636 (2004-02-01), Marchant
patent: 7403259 (2008-07-01), Kruijswijk et al.
patent: 7547495 (2009-06-01), Verstappen et al.
patent: 7580334 (2009-08-01), Kadowaki et al.
patent: 2006/0066855 (2006-03-01), Boef et al.
patent: 2006/0157698 (2006-07-01), Miyajima
patent: 2007/0104050 (2007-05-01), Ueda
patent: 1 628 164 (2006-02-01), None
patent: 1 628 164 (2006-04-01), None
patent: 57-098139 (1982-06-01), None
patent: 60-042984 (1985-03-01), None
patent: 60-210733 (1985-10-01), None
patent: 61-065672 (1986-04-01), None
patent: 62-146081 (1987-06-01), None
patent: 2-089413 (1990-03-01), None
patent: 2-246026 (1990-10-01), None
patent: 02265025 (1990-10-01), None
patent: H2-265025 (1990-10-01), None
patent: 4-329079 (1992-11-01), None
patent: 10-067742 (1998-03-01), None
patent: 2005-142576 (2005-06-01), None
patent: 2006-40380 (2006-02-01), None
patent: 2006-146175 (2006-06-01), None
patent: 2006-196716 (2006-07-01), None
patent: 2007-173807 (2007-07-01), None
Notice of Reasons for Rejection mailed Dec. 4, 2009 for Japanese Application No. 2008-180849, 4 pgs.
Franken Robert
Pellemans Henricus Petrus Maria
Van Boxmeer Johan Maria
ASML Netherlands B.V.
Nguyen Sang
Sterne Kessler Goldstein & Fox P.L.L.C.
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