Inspection apparatus for thin film transistor substrate

Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Lumped type parameters

Reexamination Certificate

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C250S306000, C345S904000

Reexamination Certificate

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07362123

ABSTRACT:
An inspection apparatus for a TFT substrate formed with a plurality of pixels, includes a reference substrate being opposite to and spaced from the TFT substrate and formed with a plurality of reference patterns corresponding to the pixels, a power supply to supply power to both a predetermined number of the pixels and the corresponding reference pattern to form an electric field in a space between the TFT substrate and the reference substrate, an electron beam emitter to emit an electron beam to travel from a first side to a second side of the space, an electron beam detector to detect the electron beam emitted from the electron beam emitter and passed through the space, and a controller to determine whether the TFT substrate includes a defective pixel based on a location of the electron beam detected by the electron beam detector. Thus, the inspection apparatus can correctly and quickly inspect the TFT substrate for defects in a low vacuum state regardless a size of the TFT substrate.

REFERENCES:
patent: 5432461 (1995-07-01), Henley
patent: 6765203 (2004-07-01), Abel
patent: 6873175 (2005-03-01), Toro-Lira et al.
patent: 7132671 (2006-11-01), Hatajima
patent: 7157921 (2007-01-01), Shonohara
patent: 2004/0223140 (2004-11-01), Shonohara
patent: 1997-75840 (1997-12-01), None

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