Inductor formed in an integrated circuit

Details Inductor formed in an integrated circuit Inductor formed in an integrated circuit

2006-05-01

2009-06-02

Nguyen, Tuyen T. (Department: 2832)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C336S200000

Reexamination Certificate

active

07541238

ABSTRACT:
An inductor formed within an integrated circuit and a method for forming the inductor. The inductor comprises an underlying layer of aluminum formed in a first metallization layer and patterned and etched into the desired shape. In one embodiment the aluminum line comprises a spiral shape. According to a damascene process, a conductive runner, preferably of copper, is formed in a dielectric layer overlying the aluminum line and in electrical contact therewith. The aluminum line and the conductive runner cooperate to form the inductor. In another embodiment the aluminum line and the conductive runner are formed in a vertically spaced-apart orientation, with tungsten plugs or conductive vias formed to provide electrical connection therebetween. A method for forming the inductor comprises forming an aluminum conductive line and forming a conductive runner over the conductive line.

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