Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1994-11-01
1997-03-04
Breneman, R. Bruce
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
216 71, 118723I, 156345, 31511151, C23F 400
Patent
active
056075421
ABSTRACT:
A method and apparatus for generating a medium density plasma in a reactive ion etching chamber. A conventional reactive ion etching technique, using multiple electrodes for capacitive coupling of power into the chamber to establish and sustain a plasma, is combined with inductive coupling for plasma enhancement only. A first source of high frequency power is coupled to at least one of the electrodes to generate the plasma under conditions similar to those used in a conventional reactive ion etching system, and a second source of high frequency power is coupled to an inductive coil surrounding the plasma, to enhance the plasma density without adversely affecting wafers being processed in the chamber.
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Wu Robert
Yin Gerald Z.
Applied Materials Inc.
Breneman R. Bruce
Goudreau George
Heal Noel F.
Sgarbossa Peter J.
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