Inductively coupled plasma reactor with an inductive coil antenn

Details Inductively coupled plasma reactor with an inductive coil antenn Inductively coupled plasma reactor with an inductive coil antenn

1999-05-03

2000-01-18

Le, Hoanganh

Communications: radio wave antennas

Antennas

Spiral or helical type

343867, 31511151, H01Q 136

Patent

active

060161310

ABSTRACT:
An inductively coupled plasma reactor for processing a substrate has an inductively coupled coil antenna including plural inductive antenna loops which are electrically separated from one another and independently connected to separately controllable plasma source RF power supplies. The RF power level in each independent antenna loop is separately programmed and instantly changeable to provide a perfectly uniform plasma ion density distribution across the entire substrate surface under a large range of plasma processing conditions, such as different process gases or gas mixtures. In a preferred embodiment, there are as many separately controllable RF power supplies as there are independent antenna loops, and all the separately controllable power supplies receive their RF power from a commonly shared RF generator.

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Stewart, R.A., Vitello, P., Graves, D.B., Jaeger, E.F., Berry, L.A., "Plasma uniformity in high-density inductively coupled plasma tools," Plasma Sources Science Technology, No. 4, 1995, pp. 36-46, Great Britain.

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