Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
Reexamination Certificate
2011-03-01
2011-03-01
Smith, Matthew S (Department: 2823)
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
Amorphous semiconductor
C438S479000, C438S480000, C438S481000, C438S482000
Reexamination Certificate
active
07897493
ABSTRACT:
Strain is induced in a semiconductor layer. Embodiments include inducing strain by, for example, creation of free surfaces.
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Carroll Mark
Fiorenza James
Lochtefeld Anthony J.
Parker John M
Slater & Matsil L.L.P.
Smith Matthew S
Taiwan Semiconductor Manufacturing Company , Ltd.
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