Incremental tune etch apparatus and method

Details Incremental tune etch apparatus and method Incremental tune etch apparatus and method

1990-10-29

1991-12-31

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

165651, 165654, 165662, 165345, H01L 21306, B44C 122

Patent

active

050768867

ABSTRACT:
A method of performing a liquid etching operation on a wafer surface includes placing the wafer into an etch container, filling the etch container with a liquid etch solution, retaining the etch solution in the etch container for a short predetermined length of time, releasing the etch solution from the etch container, and then repeating the above steps without replacing the wafer, to obtain a series of short etch cycles having collectively a predictable average etch rate.

REFERENCES:
patent: 3105784 (1963-10-01), Topas
patent: 3549439 (1970-12-01), Kaveggia et al.
patent: 4426251 (1984-01-01), Ida et al.
patent: 4436580 (1984-03-01), Boyd et al.
patent: 4734151 (1988-03-01), Ives et al.

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