Increasing an electrical resistance of a resistor by...

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics

Reexamination Certificate

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C257S536000, C257S538000, C257S904000, C257S914000, C438S210000, C438S329000

Reexamination Certificate

active

06730984

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Technical Field
The present invention provides a method and structure for increasing an electrical resistance of a resistor that is located within a semiconductor structure such as a semiconductor wafer, a semiconductor chip, and an integrated circuit.
2. Related Art
A resistor on a wafer may have its electrical resistance trimmed by using laser ablation to remove a portion of the resistor. For example, the laser ablation may cut slots in the resistor. With existing technology, however, trimming a resistor by using laser ablation requires the resistor to have dimensions on the order of tens of microns. A method and structure is needed to increase the electrical resistance of a resistor on a wafer generally, and to increase the electrical resistance of a resistor having dimensions at a micron or sub-micron level.
SUMMARY OF THE INVENTION
The present invention provides a method for increasing an electrical resistance of a resistor, comprising the steps of:
providing a semiconductor structure that includes the resistor; and
oxidizing a fraction F of a surface layer of the resistor with oxygen particles, resulting in the increasing of the electrical resistance of the resistor.
The present invention provides an electrical structure, comprising:
a semiconductor structure that includes a resistor; and
oxygen particles in an oxidizing reaction with a fraction F of a surface layer of the resistor, wherein the oxidizing reaction increases an electrical resistance of the resistor.
The present invention provides a method for increasing an electrical resistance of a resistor, comprising the steps of:
providing a semiconductor structure that includes the resistor; and
nitridizing a fraction F of a surface layer of the resistor with nitrogen particles, resulting in the increasing of the electrical resistance of the resistor.
The present invention provides an electrical structure, comprising:
a semiconductor structure that includes a resistor; and
nitrogen particles in an nitridizing reaction with a fraction F of a surface layer of the resistor, wherein the nitridizing reaction increases an electrical resistance of the resistor.
The present invention provides a method and structure for increasing an electrical resistance of a resistor on a wafer generally, and for increasing the electrical resistance of a resistor having dimensions at a micron or sub-micron level.


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patent: 5232865 (1993-08-01), Manning et al.
patent: 5254217 (1993-10-01), Maniar et al.
patent: 5470780 (1995-11-01), Shishiguchi
patent: 5661503 (1997-08-01), Terai
patent: 5917286 (1999-06-01), Scholl et al.
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patent: 6031250 (2000-02-01), Brandes et al.
patent: 6043516 (2000-03-01), Schulze
patent: 6127217 (2000-10-01), Madurawe et al.

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