Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1997-12-04
1998-10-27
Martin-Wallace, Valencia
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257358, 257360, 257903, 438238, 438385, H01L 2976, H01L 2994
Patent
active
058281118
ABSTRACT:
A method for fabricating polysilicon load resistors, with increased resistance values, for use in SRAM cells, has been developed. An underlying, raised grid topography is used to allow the overlying polysilicon load resistor to traverse the severe topography, resulting in an increase in resistor length, while still maintaining the allotted design space, overlying a MOSFET device. The formation of back to back diodes in the polysilicon load resistor also results in an increase in resistance. The back to back diodes are created via N type, ion implantation into only flat regions of an intrinsic, or P type doped, polysilicon load resistor, regions in which the polysilicon load resistor overlaid the flat regions of the underlying raised grid topography, leaving regions of the polysilicon load resistor, located on the sides of the underlying raised grid topography, P type.
REFERENCES:
patent: 5146107 (1992-09-01), Matsuoka et al.
patent: 5424239 (1995-06-01), Sweeney
patent: 5461000 (1995-10-01), Liang
patent: 5554552 (1996-09-01), Chi
patent: 5554554 (1996-09-01), Bastani et al.
Huang Jenn Ming
Lin Yi-Miaw
Ackerman Stephen B.
Martin-Wallace Valencia
Saile George O.
Taiwan Semiconductor Manufacturing Company , Ltd.
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