In-situ critical dimension measurement

Details In-situ critical dimension measurement In-situ critical dimension measurement

2007-11-27

2007-11-27

Lyons, Michael A. (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

11053300

ABSTRACT:
A method of monitoring a critical dimension of a structural element in an integrated circuit is provided comprising the following steps: collecting an optical interference endpoint signal produced during etching one or more layers to form the structural element; and determining based upon the optical interference endpoint signal the critical dimension of the structural element.

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http://www.fabtech.org/site-yieldmanagement
ews/2001/08/08/03.shtml on May 13, 2004, 2 pages.

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