Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2007-11-27
2007-11-27
Lyons, Michael A. (Department: 2877)
Optics: measuring and testing
By light interference
For dimensional measurement
Reexamination Certificate
active
11053300
ABSTRACT:
A method of monitoring a critical dimension of a structural element in an integrated circuit is provided comprising the following steps: collecting an optical interference endpoint signal produced during etching one or more layers to form the structural element; and determining based upon the optical interference endpoint signal the critical dimension of the structural element.
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http://www.fabtech.org/site-yieldmanagement
ews/2001/08/08/03.shtml on May 13, 2004, 2 pages.
Chiu Yuan-Hung
Tao Hun-Jan
Tsai Chao-Tzung
Wang Shiang-Bau
Duane Morris LLP
Lyons Michael A.
Taiwan Semiconductor Manufacturing Co. Ltd.
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