In-situ cleaning of a polymer coated plasma processing chamber

Details In-situ cleaning of a polymer coated plasma processing chamber In-situ cleaning of a polymer coated plasma processing chamber

2006-02-07

2006-02-07

Kornakov, M. (Department: 1746)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With workpiece support

C156S345350, C156S345360, C156S345410, C156S345420, C156S043000, C156S345470, C156S345480, C118S7230AN

Reexamination Certificate

active

06994769

ABSTRACT:
An apparatus configured to remove chamber deposits between process operations is provided. The processing chamber includes a top electrode in communication with a power supply. A processing chamber defined within a base, a sidewall extending from the base, and a top disposed on the sidewall is provided. The processing chamber has an outlet enabling removal of fluids within the processing chamber. The processing chamber includes a substrate support and an inner surface of the processing chamber defined by the base, the sidewall and the top. The inner surface is coated with a fluorine containing polymer coating. The fluorine containing polymer coating is configured to release fluorine upon creation of an oxygen plasma in the processing chamber to remove a residue deposited on the fluorine containing polymer coating. The residue was deposited on the polymer coating from a processing operation performed in the processing chamber.

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patent: 5622565 (1997-04-01), Ye et al.
patent: 6083412 (2000-07-01), Rice et al.
patent: 4-91432 (1992-03-01), None
patent: 7-106301 (1995-04-01), None

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