In-situ cleaning apparatuses for wafers used in integrated circu

Details In-situ cleaning apparatuses for wafers used in integrated circu In-situ cleaning apparatuses for wafers used in integrated circu

1998-03-19

2000-07-25

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

Automatic controls

134 951, 1341001, 134105, 134113, 1341041, 134902, B08B 310

Patent

active

060925396

ABSTRACT:
Apparatuses for cleaning wafers used in integrated circuit devices comprise: (1) a dry cleaning section comprising inert gas storage bath, a hydrogen fluoride gas storage bath, and a vapor storage bath containing a component selected from the group consisting of water vapor, alcohol vapor, and mixtures thereof and a gas mixer, wherein the inert gas storage bath, the hydrogen fluoride gas storage bath, and the vapor storage bath are in communication with the gas mixer; (2) a wet cleaning section comprising a first bath for storing a fluoride; a second bath for storing a liquid alcohol; and a cleaning solution storage bath in communication with the first bath and second bath, wherein the fluoride and the liquid alcohol form a cleaning solution which is stored in the cleaning solution storage bath; and (3) a common cleaning bath positioned between and in communication with the dry cleaning section and the wet cleaning section.

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