Improving etch resistance of a casein-based photoresist

Details Improving etch resistance of a casein-based photoresist Improving etch resistance of a casein-based photoresist

1979-03-16

1980-10-28

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430 23, 430313, 430318, 430331, G03C 500

Patent

active

042307945

ABSTRACT:
The etch resistance of a casein-based photoresist pattern to low specific gravity ferric chloride based etchant solutions is increased by treating the photoresist pattern with a formaldehyde solution containing at least 10 percent formaldehyde by volume by a period of at least 30 seconds, and thereafter drying the photoresist pattern.

REFERENCES:
patent: 3186847 (1965-06-01), Willems et al.
patent: 3186848 (1965-06-01), Willems et al.
patent: 4061529 (1977-12-01), Goldman et al.

Affiliated with

Also associated with

Rating

Improving etch resistance of a casein-based photoresist does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Improving etch resistance of a casein-based photoresist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Improving etch resistance of a casein-based photoresist will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-268743