Immersion objective lens for e-beam inspection

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Reexamination Certificate

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Details

C250S306000, C250S307000, C250S311000, C250S3960ML, C250S3960ML, C250S397000, C250S398000

Reexamination Certificate

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06858843

ABSTRACT:
Disclosed is an apparatus for electron beam inspection of a specimen with improved potential throughput. The apparatus includes an immersion objective lens focusing the primary electrons into a beam that impinges onto a spot on the specimen. Also disclosed is a method for automatic electron beam inspection of a specimen. The method includes producing a magnetic field towards the specimen that reduces aberration towards an outer portion of the multiple pixel imaging region.

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patent: 6720557 (2004-04-01), Frosien
Min Cheng, et al. “Optimization design of immersion magnetic lenses in projection electron beam lithography” International Journal for light and electron optics; Jan. 24, 2001, pp. 149-151; Jiaotong University, P.R. China.
Min Cheng, et al. “Study on wide beam curved optical axes focusing for magnetic immersed lenses without crossovers” International Journal for light and electron optics; May 28, 2000, pp. 509-513; Jiaotong University, P.R. China.
Min Cheng, et al. “Curvilinear-axis focusing and aberration theory of wide electron beams for combined immersion magnetic-electrostatic lens systems” International Journal for light and electron optics; Feb. 5, 2001 pp. 259-267; Jiaotong University, P.R. China.
M. Mankos, et al. “Multisource optimization of a column for electron lithography” J. Vac. Sci. Technology B, Nov./Dec. 2000, pp. 3010-3016, vol. 18, No. 6; Etec Systems, Hayward, California U.S.A.

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