Immersion development and rinse machine and process

Details Immersion development and rinse machine and process Immersion development and rinse machine and process

1987-12-17

1990-02-20

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430326, 354317, 354320, 354324, 354330, G03C 500

Patent

active

049026089

ABSTRACT:
A method of processing semiconductor wafers to develop photoresist patterns which includes mounting a semiconductor on a vacuum chuck, immersing and spinning the semiconductor wafer in a developer fluid, removing the semiconductor wafer from the semiconductor wafer from the developer fluid, lowering the semiconductor wafer into the rinse bath, then removing the semiconductor wafer from the rinse bath and spin drying it.

REFERENCES:
patent: 4136940 (1979-01-01), Lin
patent: 4429983 (1984-02-01), Cortellino et al.

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