Image reversal process utilizing a positive-working photosensiti

Details Image reversal process utilizing a positive-working photosensiti Image reversal process utilizing a positive-working photosensiti

1990-03-28

1991-11-19

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430165, 430191, 430328, 430330, 430192, 430196, 430197, 430270, G03C 500, G03C 152

Patent

active

050665677

ABSTRACT:
A positive-working photosensitive composition is disclosed that comprises a photosensitive compound which is either of the o-quinone diazide type or comprises a photolytic acid donor in combination with a compound containing a C-O-C group, a binder which is soluble or swellable in an aqueous-alkaline solution and a dye of the general formula I ##STR1## The photosensitive composition of the present invention has a higher photosensitivity than comparable compositions containing other dyes.

REFERENCES:
patent: 4349619 (1982-09-01), Kamoshida et al.
patent: 4575480 (1986-03-01), Kotani et al.
patent: 4581321 (1986-04-01), Stahlhofen
patent: 4626492 (1986-12-01), Eilbeck
patent: 4762767 (1988-08-01), Haas et al.
patent: 4931381 (1990-06-01), Spak et al.
English language abstract of Japanese Publication #61-093,445, Published.
English language abstract of Japanese Publication #61-098,344, Published.
English language abstract of Japanese Publication #61-109,048, Published.
English language abstract of Japanese Publication #61-109,049, Published.
Neureuther, A. R. et al., "Photoresist Modeling and Device Fabrication Applications", Proc. of Symposium on Optical & Acoustical Micro-Electronics, 1974, pp. 233-249.
Stover, H. L. et al., "Submicron Optical Lithography: I-Line Lens and Photoresist Technology"; SPIE vol. 470 Opt. Microlite. III: Tech. for Next Decade; 1984, pp. 22-23.
Bol, I. I., "High Resolution Optical Lithography Using Dyed Single-Layer Resist", Proc. Kodak Microelectronics Semi 1984, pp. 19-22.
Brown, A. V. et al., "Optimization of Resist Optical Density . . . Surfaces": SPIE vol. 539, Advances in Resist Tech. & Process II: 1985, pp. 259-266.
Watts, M. P. C. et al., "The Reduction of Reflective Notches Using Dyed Resist", Proc. of 7th Int. Tech. Conf. on Photopolymer; 10/1985, pp. 285-286.
Pampalone, T. R. et al., "Improving Linewidth Control . . . Resists"; Journal of the Electrochem. Soc., vol. 133, No. 1; Jan. 1986; pp. 192-196.

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