Image reversal

Details Image reversal Image reversal

1987-05-18

1988-10-04

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430328, 430330, 430394, 430270, G03C 516

Patent

active

047756098

ABSTRACT:
A positive acting photoresist system including a hydrophobic blocked polymer can be made to function in a negative sense (or tone) in what is known as an "image reversal" process, which may be summarized as follows:

REFERENCES:
patent: 4104070 (1978-08-01), Moritz et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4546066 (1985-10-01), Field et al.
L. F. Thompson et al., ACS Symposium Series 219, 117 (1983).
Semiconductor International, Apr. 1987, pp. 88-89.
M. Spak et al., Proceedings of the SPE Regional Technical Conference on "Photopolymers: Priciples, Processes, and Materials," Ellenville, N.Y. (1985), p. 247-269.
R. M. R. Gijsen et al., SPIE vol. 631, Advances in Resist Technology and Processing III, (1986), pp. 108-116.

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