X-ray or gamma ray systems or devices – Specific application – Lithography
Reexamination Certificate
2008-07-15
2008-07-15
Ho, Allen C. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Lithography
C378S084000, C378S085000, C250S492200, C355S053000, C355S067000, C355S070000, C355S071000, C359S621000, C359S622000, C359S627000
Reexamination Certificate
active
10040717
ABSTRACT:
There is provided an illumination system for lithography with wavelengths of ≦193 mn. The system comprises a first optical element, which is divided into first raster elements and lies in a first plane. The first plane defines an x-direction and a y-direction, the first raster elements each have an x-direction and a y-direction with an aspect ratio, and at least two of the first raster elements have aspect ratios of different magnitude.
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European Search Report dated Feb. 16, 2006 in connection with corresponding European Patent Application No. 01127095.6-2222.
Antoni Martin
Singer Wolfgang
Ulrich Wilhelm
Carl Zeiss SMT AG
Ho Allen C.
Ohlandt Greeley Ruggiero & Perle L.L.P.
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