Illumination system with raster elements of different sizes

X-ray or gamma ray systems or devices – Specific application – Lithography

Reexamination Certificate

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C378S084000, C378S085000, C250S492200, C355S053000, C355S067000, C355S070000, C355S071000, C359S621000, C359S622000, C359S627000

Reexamination Certificate

active

10040717

ABSTRACT:
There is provided an illumination system for lithography with wavelengths of ≦193 mn. The system comprises a first optical element, which is divided into first raster elements and lies in a first plane. The first plane defines an x-direction and a y-direction, the first raster elements each have an x-direction and a y-direction with an aspect ratio, and at least two of the first raster elements have aspect ratios of different magnitude.

REFERENCES:
patent: 4682885 (1987-07-01), Torigoe
patent: 5098184 (1992-03-01), Van den Brandt et al.
patent: 5251067 (1993-10-01), Kamon
patent: 5315629 (1994-05-01), Jewell et al.
patent: 5339346 (1994-08-01), White
patent: 5361292 (1994-11-01), Sweatt
patent: 5439781 (1995-08-01), MacDowell et al.
patent: 5512759 (1996-04-01), Sweatt
patent: 5581605 (1996-12-01), Murakami et al.
patent: 5594526 (1997-01-01), Mori et al.
patent: 5636003 (1997-06-01), Tanitsu et al.
patent: 5662401 (1997-09-01), Shimizu et al.
patent: 5669708 (1997-09-01), Mashima et al.
patent: 5677939 (1997-10-01), Oshino
patent: 5719709 (1998-02-01), Kodaka
patent: 5737137 (1998-04-01), Cohen et al.
patent: 5754278 (1998-05-01), Kurtz
patent: 5805365 (1998-09-01), Sweatt
patent: 5896438 (1999-04-01), Miyake et al.
patent: 5912725 (1999-06-01), Tanitsu
patent: 5963305 (1999-10-01), Mizouchi
patent: 6002467 (1999-12-01), Nishi et al.
patent: 6057899 (2000-05-01), Tanaka et al.
patent: 6181482 (2001-01-01), Grafton
patent: 6195201 (2001-02-01), Koch et al.
patent: 6198793 (2001-03-01), Schultz et al.
patent: 6219111 (2001-04-01), Fukuda et al.
patent: 6260972 (2001-07-01), Robinson et al.
patent: 6337759 (2002-01-01), Yamamoto
patent: 6400794 (2002-06-01), Schultz et al.
patent: 6402325 (2002-06-01), Yamamoto
patent: 6438199 (2002-08-01), Schultz et al.
patent: 6504896 (2003-01-01), Miyake et al.
patent: 6507440 (2003-01-01), Schultz
patent: 6594334 (2003-07-01), Ota
patent: 6637892 (2003-10-01), Okuyama et al.
patent: 6704095 (2004-03-01), Schultz
patent: 6741394 (2004-05-01), Tanitsu et al.
patent: 6833904 (2004-12-01), Komatsuda
patent: 19903807 (1999-11-01), None
patent: WO9949505 (1999-09-01), None
Eugene Hecht and Alfred Zajac. Optics (Reading, MA: Addison-Wesley, 1979), p. 144-145.
European Search Report dated Feb. 16, 2006 in connection with corresponding European Patent Application No. 01127095.6-2222.

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