Illumination system with field mirrors for producing uniform...

Details Illumination system with field mirrors for producing uniform... Illumination system with field mirrors for producing uniform...

2006-10-24

2006-10-24

Font, Frank G. (Department: 2883)

Radiant energy

Irradiation of objects or material

C250S306000, C250S492220, C250S492230

Reexamination Certificate

active

07126137

ABSTRACT:
This invention relates to an Ilumination system for scanning lithography especially for wavelengths≦193 nm, particularly EUV lithography, for the illumination of a slit, comprising at least one field mirror or at least one field lens and being characterized in that at least one of the field mirror(s) or the field lens(es) has (have) an aspheric shape.

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