X-ray or gamma ray systems or devices – Specific application – Lithography
Reexamination Certificate
2007-07-24
2007-07-24
Ho, Allen C. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Lithography
C378S084000, C250S492200, C355S067000, C355S071000, C359S566000, C359S569000
Reexamination Certificate
active
09961819
ABSTRACT:
An illumination system, particularly for wavelengths ≦100 nm, with an object plane and a field plane, comprises a grating element and a physical diaphragm in a diaphragm plane, which is arranged downstream to the grating element in the beam path from the object plane to the field plane.
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Kleemann Bernd
Singer Wolfgang
Weiss Markus
Carl Zeiss SMT AG
Ho Allen C.
Ohlandt Greeley Ruggiero & Perle L.L.P.
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