Illumination system particularly for microlithography

Details Illumination system particularly for microlithography Illumination system particularly for microlithography

2008-01-23

2008-11-25

Font, Frank G (Department: 2883)

Radiant energy

Invisible radiant energy responsive electric signalling

With or including a luminophor

C250S372000, C250S461100, C250S50400H, C250S492100, C250S492200, C250S492220

Reexamination Certificate

active

07456408

ABSTRACT:
There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is illuminated, and a grazing incidence mirror situated in a light path from the optical element to the plane, after the optical element. The illumination system has no other grazing incidence mirror in the light path, after the optical element and before the plane.

REFERENCES:
patent: 4195913 (1980-04-01), Dourte et al.
patent: 4294538 (1981-10-01), Ban
patent: 4389115 (1983-06-01), Richter
patent: 4424589 (1984-01-01), Thomas et al.
patent: 4457618 (1984-07-01), Plummer
patent: 4651012 (1987-03-01), Clark et al.
patent: 4688932 (1987-08-01), Suzuki
patent: 4723154 (1988-02-01), Kuwayana
patent: 4736110 (1988-04-01), Awamura
patent: 4740276 (1988-04-01), Marmo et al.
patent: 5071240 (1991-12-01), Ichihara et al.
patent: 5148442 (1992-09-01), O'Neill et al.
patent: 5222112 (1993-06-01), Terasawa et al.
patent: 5339346 (1994-08-01), White
patent: 5353322 (1994-10-01), Bruning et al.
patent: 5361292 (1994-11-01), Sweatt
patent: 5402267 (1995-03-01), Furter et al.
patent: 5439781 (1995-08-01), MacDowell et al.
patent: 5440423 (1995-08-01), Ogura
patent: 5459547 (1995-10-01), Shiozawa
patent: 5512759 (1996-04-01), Sweatt
patent: 5581605 (1996-12-01), Murakami et al.
patent: 5644383 (1997-07-01), Mori
patent: 5647664 (1997-07-01), Hanecka
patent: 5669708 (1997-09-01), Mashima et al.
patent: 5677939 (1997-10-01), Oshino
patent: 5686728 (1997-11-01), Shafer et al.
patent: 5715084 (1998-02-01), Takahashi et al.
patent: 5737137 (1998-04-01), Cohen et al.
patent: 5755503 (1998-05-01), Chen et al.
patent: 5796524 (1998-08-01), Oomura
patent: 5805356 (1998-09-01), Chiba
patent: 5846678 (1998-12-01), Nishigori et al.
patent: 5896438 (1999-04-01), Miyake et al.
patent: 5963305 (1999-10-01), Mizouchi
patent: 5993010 (1999-11-01), Ohzawa et al.
patent: 5995582 (1999-11-01), Terashima et al.
patent: 6072852 (2000-06-01), Hudyma
patent: 6081319 (2000-06-01), Ozawa et al.
patent: 6198793 (2001-03-01), Schultz et al.
patent: 6208707 (2001-03-01), Oshino
patent: 6229647 (2001-05-01), Takahashi et al.
patent: 6244717 (2001-06-01), Dinger
patent: 6255661 (2001-07-01), Braat
patent: 6339467 (2002-01-01), Sato
patent: 6400794 (2002-06-01), Schultz et al.
patent: 6426506 (2002-07-01), Hudyma
patent: 6438199 (2002-08-01), Schultz et al.
patent: 6498351 (2002-12-01), Kruizinga et al.
patent: 6507440 (2003-01-01), Schultz
patent: 6583937 (2003-06-01), Wangler et al.
patent: 6594334 (2003-07-01), Ota
patent: RE38438 (2004-02-01), Takahashi
patent: 6781671 (2004-08-01), Komatsuda
patent: 2001/0002155 (2001-05-01), Takahashi et al.
patent: 0066295 (1982-12-01), None
patent: 0359018 (1990-03-01), None
patent: 0939341 (1999-09-01), None
patent: 0962830 (1999-12-01), None
patent: 1026547 (2000-08-01), None
patent: 1067437 (2001-01-01), None
patent: 1209503 (2002-05-01), None
International Search Report dated Mar. 23, 2004.
Murphy et al., “Synchrotron Radiation Sources and Condensers for Projection X-Ray Lithography,” Applied Optics, vol. 32, No. 34, pp. 6920-6929, Dec. 1993.
“Handbook on Synchrotron Radiation,” Ernst-Echard Koch ed., pp. 140-145, 1098-1111, 1983.

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