Illumination system particularly for microlithography

Radiant energy – Invisible radiant energy responsive electric signalling – With or including a luminophor

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S372000, C359S633000, C359S366000, C359S487030, C359S727000

Reexamination Certificate

active

10919583

ABSTRACT:
There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.

REFERENCES:
patent: 4195913 (1980-04-01), Dourte et al.
patent: 4294538 (1981-10-01), Ban
patent: 4389115 (1983-06-01), Richter
patent: 4651012 (1987-03-01), Clark et al.
patent: 4688932 (1987-08-01), Suki
patent: 4740276 (1988-04-01), Marmo et al.
patent: 5071240 (1991-12-01), Ichihara et al.
patent: 5148442 (1992-09-01), O'Neil et al.
patent: 5222112 (1993-06-01), Terasawa et al.
patent: 5339346 (1994-08-01), White
patent: 5353322 (1994-10-01), Bruning et al.
patent: 5361292 (1994-11-01), Sweatt
patent: 5402267 (1995-03-01), Furter et al.
patent: 5439781 (1995-08-01), MacDowell et al.
patent: 5440423 (1995-08-01), Ogura
patent: 5459547 (1995-10-01), Shiozawa
patent: 5512759 (1996-04-01), Sweatt
patent: 5581605 (1996-12-01), Murakami et al.
patent: 5644383 (1997-07-01), Mori
patent: 5647664 (1997-07-01), Hane{hacek over (c)}ka
patent: 5669708 (1997-09-01), Mashima et al.
patent: 5677939 (1997-10-01), Oshino
patent: 5686728 (1997-11-01), Shafer et al.
patent: 5715084 (1998-02-01), Takahashi et al.
patent: 5737137 (1998-04-01), Cohen et al.
patent: 5755503 (1998-05-01), Chen et al.
patent: 5796524 (1998-08-01), Oomura
patent: 5805356 (1998-09-01), Chiba
patent: 5846678 (1998-12-01), Nishigori et al.
patent: 5896438 (1999-04-01), Miyake et al.
patent: 5963305 (1999-10-01), Mizouchi
patent: 5993010 (1999-11-01), Ohzawa et al.
patent: 5995582 (1999-11-01), Terashima et al.
patent: 6057899 (2000-05-01), Tanaka et al.
patent: 6072852 (2000-06-01), Hudyma
patent: 6081319 (2000-06-01), Ozawa et al.
patent: 6198793 (2001-03-01), Schultz et al.
patent: 6208707 (2001-03-01), Oshino
patent: 6229647 (2001-05-01), Takahashi et al.
patent: 6244717 (2001-06-01), Dinger
patent: 6255661 (2001-07-01), Braat
patent: 6339467 (2002-01-01), Sato
patent: 6400794 (2002-06-01), Schultz et al.
patent: 6426506 (2002-07-01), Hudyma
patent: 6438199 (2002-08-01), Schultz et al.
patent: 6498351 (2002-12-01), Kruizinga et al.
patent: 6507440 (2003-01-01), Schultz
patent: 6583937 (2003-06-01), Wangler et al.
patent: 6594334 (2003-07-01), Ota
patent: RE38438 (2004-02-01), Takahashi
patent: 6781671 (2004-08-01), Komatsuda
patent: 2001/0002155 (2001-05-01), Takahashi et al.
patent: 0066295 (1982-12-01), None
patent: 0359018 (1990-03-01), None
patent: 0 939 341 (1999-09-01), None
patent: 0939341 (1999-09-01), None
patent: 0 962 830 (1999-12-01), None
patent: 1026547 (2000-08-01), None
patent: 1 067 437 (2001-01-01), None
patent: 1 209 503 (2002-05-01), None
Internationl Search Report, dated Mar. 23, 2004.
Murphy et al., “Synchrotron Radiation Sources and Condensers for Projection X-Ray Lithography”, Applied Optics, vol. 32, No. 34, pp. 6920-6929 (Dec. 1, 1993).
“Handbook on Synchrotron Radiation”, Ernst-Echard Koch ed., pp. 140-145, 1098-1111 (1983).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Illumination system particularly for microlithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Illumination system particularly for microlithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Illumination system particularly for microlithography will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3791966

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.