Illumination system, particularly for EUV lithography

Details Illumination system, particularly for EUV lithography Illumination system, particularly for EUV lithography

2006-12-12

2006-12-12

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C378S034000

Reexamination Certificate

active

07148495

ABSTRACT:
There is provided an illumination system. The illumination system includes a light source for emitting light having a wavelength ≦193 nm, an optical system, and a radiation protection wall situated between the light source and the optical system.

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