Illumination system, particularly for EUV lithography

Details Illumination system, particularly for EUV lithography Illumination system, particularly for EUV lithography

2005-02-22

2005-02-22

Bruce, David V. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Lithography

C378S145000, C378S146000, C378S147000, C378S154000

Reexamination Certificate

active

06859515

ABSTRACT:
There is provided an illumination system for light having wavelengths ≦193 nm. The system includes (a) a first raster element for receiving a first diverging portion of the light and directing a first beam of the light, (b) a second raster element for receiving a second diverging portion of the light and directing a second beam of the light, where the first raster element is oriented at an angle with respect to the second raster element to cause a center ray of the first beam to intersect with a center ray of the second beam at an image plane, and (c) an optical element for imaging secondary sources of the light in an exit pupil, where the optical element is situated in a path of the light after the first and second raster elements and before the image plane.

REFERENCES:
patent: 4195913 (1980-04-01), Dourte et al.
patent: 4294538 (1981-10-01), Ban
patent: 4389115 (1983-06-01), Richter
patent: 4651012 (1987-03-01), Clark et al.
patent: 4740276 (1988-04-01), Marmo et al.
patent: 5148442 (1992-09-01), O'Neil et al.
patent: 5222112 (1993-06-01), Terasawa et al.
patent: 5339346 (1994-08-01), White
patent: 5361292 (1994-11-01), Sweatt
patent: 5402267 (1995-03-01), Fürter et al.
patent: 5439781 (1995-08-01), MacDowell et al.
patent: 5440423 (1995-08-01), Ogura
patent: 5512759 (1996-04-01), Sweatt
patent: 5581605 (1996-12-01), Murakami et al.
patent: 5647664 (1997-07-01), Hane{hacek over (c)}ka
patent: 5669708 (1997-09-01), Mashima et al.
patent: 5677939 (1997-10-01), Oshino
patent: 5737137 (1998-04-01), Cohen et al.
patent: 5755503 (1998-05-01), Chen et al.
patent: 5896438 (1999-04-01), Miyake et al.
patent: 5993010 (1999-11-01), Ohzawa et al.
patent: 5995582 (1999-11-01), Terashima et al.
patent: 6570168 (2003-05-01), Schultz et al.
patent: 0066295 (1982-12-01), None
patent: 0359018 (1990-03-01), None
patent: 0939341 (1999-09-01), None
patent: 1026547 (2000-08-01), None
Murphy et al., “Synchrotron Radiation Sources and Condensers for Projection X-Ray Lithography”, APPLIED OPTICS, vol. 32, No. 34, pp. 6920-6929 (Dec. 1, 1993).
“Handbook on Synchrotron Radiation”, Ernst-Echard Koch ed., pp. 140-145, 1098-1111 (1983).

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