Illumination system for x-ray lithography

Details Illumination system for x-ray lithography Illumination system for x-ray lithography

1987-06-19

1989-05-16

Fields, Carolyn E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378156, 378159, 2505031, G21K 300

Patent

active

048316407

ABSTRACT:
This invention is directed to an improvement in an x-ray lithography system having an x-ray point source of radiation, a wafer disposed in spaced relationship with respect to the source, and a mask disposed between the source and the wafer whereby radiation from the source passes through the mask to the wafer, said improvement comprising the provision of an x-ray absorbent element mounted between the source and the wafer, said element having a radial absorption gradient profile to compensate for radial flux variation of the x-rays.

REFERENCES:
patent: 4006361 (1977-02-01), Schriber
patent: 4288695 (1981-09-01), Walters et al.

Affiliated with

Also associated with

Rating

Illumination system for x-ray lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Illumination system for x-ray lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Illumination system for x-ray lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2329543