Photocopying – Projection printing and copying cameras – Step and repeat
Patent
1994-12-08
1996-11-05
Pendegrass, Joan H.
Photocopying
Projection printing and copying cameras
Step and repeat
355 67, G03F 720, G02B 1906
Patent
active
055722873
ABSTRACT:
The invention is directed to an illuminating arrangement for selectively providing a projection microlithographic exposure apparatus with various types of illumination including conventional illumination having an adjustable coherence factor (.sigma.), illumination via an annular aperture and symmetrically inclined illumination from two or four directions. The illuminating arrangement includes a light source for emitting light; a first light collecting device for collecting a first portion of the light in a first spatial angle region of the emitted light; a first shaping device for receiving and shaping the first portion of the light into a first shaped flux of light; a second light collecting device for collecting a second portion of the light in a second spatial angle region of the emitted light; a second shaping device for receiving and shaping the second portion of the light into a second shaped flux of light; an objective defining a pupillary plane and a reticle plane downstream of the pupillary plane; and, an imaging device for imaging images of the first and second shaped fluxes of light into sectors of the pupillary plane. The objective transmits the fluxes of light to the reticle plane and the illuminating arrangement also includes a first displacing device for operating on the first shaped flux of light so as to radially and azimuthally displace the image of the first shaped flux of light in the pupillary plane and a second displacing device for operating on the second shaped flux of light so as to radially and azimuthally displace the image of the second shaped flux of light in the pupillary plane.
REFERENCES:
patent: 3770340 (1973-11-01), Cronin et al.
patent: 5208629 (1993-05-01), Matsuo et al.
patent: 5357311 (1994-10-01), Shiraishi
"Effect of central obscuration on image formation in projection lithography" by S. T. Yang et al., SPIE, vol. 1264, Optical/Laser Microlithography III, (1990), pp. 477 to 485.
Ittner Gerhard
Wangler Johannes
Carl-Zeiss-Stiftung
Ottesen Walter
Pendegrass Joan H.
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