Hybrid method for depositing semi-conductive materials

Details Hybrid method for depositing semi-conductive materials Hybrid method for depositing semi-conductive materials

1988-06-30

1995-08-08

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

148 33, 136265, 20419215, 20429826, C23C 1434

Patent

active

054395755

ABSTRACT:
The invention provides a method and apparatus for depositing alloy films useful in manufacturing photovoltaic solar cells. In the preferred embodiment an alloy comprising copper, indium, and selenium is deposited on a substrate. Sputtering is utilized to provide the copper and indium, with the selenium being provided by evaporization. Other alloys may also be formed using the disclosed apparatus and techniques.

REFERENCES:
patent: 4465575 (1984-08-01), Love et al.
patent: 4596645 (1986-06-01), Stirn

Affiliated with

Also associated with

Rating

Hybrid method for depositing semi-conductive materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Hybrid method for depositing semi-conductive materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hybrid method for depositing semi-conductive materials will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-969045