Radiation imagery chemistry: process – composition – or product th – Plural exposure steps
Reexamination Certificate
2007-12-25
2007-12-25
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Plural exposure steps
C430S005000
Reexamination Certificate
active
10792084
ABSTRACT:
A hologram reticle and method of patterning a target. A layout pattern for an image to be transferred to a target is converted into a holographic representation of the image. A hologram reticle is manufactured that includes the holographic representation. The hologram reticle is then used to pattern the target. Three-dimensional patterns may be formed in a photoresist layer of the target in a single patterning step. These three-dimensional patterns may be filled to form three-dimensional structures. The holographic representation of the image may also be transferred to a top photoresist layer of a top surface imaging (TSI) semiconductor device, either directly or using the hologram reticle. The top photoresist layer may then be used to pattern an underlying photoresist layer with the image. The lower photoresist layer is used to pattern a material layer of the device.
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Chang Chung-Hsing
Chang Shih-Ming
Chin Chih-Cheng
Chin Sheng-Chi
Lin Chin-Hsiang
Rosasco S.
Slater & Matsil L.L.P.
Taiwan Semiconductor Manufacturing Company , Ltd.
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