Hole inspection apparatus and hole inspection method using...

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Reexamination Certificate

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C324S754120

Reexamination Certificate

active

07968844

ABSTRACT:
Disclosed herein is an apparatus and method for inspecting the via holes of a semiconductor device using electron beams. The apparatus includes electron beam irradiation means, a current measuring means, and a current measuring means and data processing means. The electron beam irradiation means radiate respective electron beams to inspect a plurality of inspection target holes. The current measuring means measures current, which is generated by irradiating the electron beams, radiated from the electron beam irradiation means, through a conductive layer located under the holes, or through the conductive layer and a separate detector. The data processing means processes data acquired through the measurement of the current measuring means.

REFERENCES:
patent: 6614244 (2003-09-01), Yamada et al.
patent: 6787770 (2004-09-01), Kikuchi et al.
patent: 7038224 (2006-05-01), Kadyshevitch et al.

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