High-voltage vertical transistor with a multi-gradient drain...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S454000, C438S925000, C257SE21410

Reexamination Certificate

active

07459366

ABSTRACT:
A high-voltage transistor includes first and second trenches that define a mesa in a semiconductor substrate. First and second field plate members are respectively disposed in the first and second trenches, with each of the first and second field plate members being separated from the mesa by a dielectric layer. The mesa includes a plurality of sections, each section having a substantially constant doping concentration gradient, the gradient of one section being at least 10% greater than the gradient of another section. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

REFERENCES:
patent: 4343015 (1982-08-01), Baliga et al.
patent: 4531173 (1985-07-01), Yamada
patent: 4618541 (1986-10-01), Forouhi et al.
patent: 4626789 (1986-12-01), Nakata et al.
patent: 4626879 (1986-12-01), Colak
patent: 4665426 (1987-05-01), Allen et al.
patent: 4738936 (1988-04-01), Rice
patent: 4754310 (1988-06-01), Coe
patent: 4764800 (1988-08-01), Sander
patent: 4796070 (1989-01-01), Black
patent: 4811075 (1989-03-01), Eklund
patent: 4890144 (1989-12-01), Teng et al.
patent: 4890146 (1989-12-01), Williams et al.
patent: 4922327 (1990-05-01), Mena et al.
patent: 4926074 (1990-05-01), Singer et al.
patent: 4926243 (1990-05-01), Nakagawa et al.
patent: 4929987 (1990-05-01), Einthoven
patent: 4939566 (1990-07-01), Singer et al.
patent: 4963951 (1990-10-01), Adler et al.
patent: 4967246 (1990-10-01), Tanaka
patent: 5010024 (1991-04-01), Allen et al.
patent: 5025296 (1991-06-01), Fullerton et al.
patent: 5040045 (1991-08-01), McArthur et al.
patent: 5068700 (1991-11-01), Yamaguchi et al.
patent: 5072266 (1991-12-01), Beculua et al.
patent: 5122848 (1992-06-01), Lee et al.
patent: 5146298 (1992-09-01), Eklund
patent: 5155574 (1992-10-01), Yamaguchi
patent: 5237193 (1993-08-01), Williams et al.
patent: 5258636 (1993-11-01), Rumennik et al.
patent: 5270264 (1993-12-01), Andideh et al.
patent: 5294824 (1994-03-01), Okada
patent: 5306656 (1994-04-01), Williams et al.
patent: 5313082 (1994-05-01), Eklund
patent: 5324683 (1994-06-01), Fitch et al.
patent: 5326711 (1994-07-01), Malhi
patent: 5349225 (1994-09-01), Redwine et al.
patent: 5359221 (1994-10-01), Miyamoto et al.
patent: 5386136 (1995-01-01), Williams et al.
patent: 5438215 (1995-08-01), Tihanyi
patent: 5473180 (1995-12-01), Ludikhuize
patent: 5514608 (1996-05-01), Williams et al.
patent: 5521105 (1996-05-01), Hsu et al.
patent: 5550405 (1996-08-01), Cheung et al.
patent: 5637898 (1997-06-01), Baliga
patent: 5648283 (1997-07-01), Tsang et al.
patent: 5654206 (1997-08-01), Merrill
patent: 5656543 (1997-08-01), Chung
patent: 5659201 (1997-08-01), Wollesen
patent: 5661322 (1997-08-01), Williams et al.
patent: 5663599 (1997-09-01), Lur
patent: 5665994 (1997-09-01), Palara
patent: 5670828 (1997-09-01), Cheung et al.
patent: 5679608 (1997-10-01), Cheung et al.
patent: 5688725 (1997-11-01), Darwish et al.
patent: 5716887 (1998-02-01), Kim
patent: 5760440 (1998-06-01), Kitamura et al.
patent: 5821144 (1998-10-01), D'Anna et al.
patent: 5869875 (1999-02-01), Hebert
patent: 5917216 (1999-06-01), Floyd et al.
patent: 5929481 (1999-07-01), Hshieh et al.
patent: 5943595 (1999-08-01), Akiyama et al.
patent: 5969408 (1999-10-01), Perelli
patent: 5973360 (1999-10-01), Tihanyi
patent: 5998833 (1999-12-01), Baliga
patent: 6010926 (2000-01-01), Rho et al.
patent: 6040600 (2000-03-01), Uenishi
patent: 6049108 (2000-04-01), Williams et al.
patent: 6054752 (2000-04-01), Hara et al.
patent: 6084277 (2000-07-01), Disney et al.
patent: 6097063 (2000-08-01), Fujihira
patent: 6127703 (2000-10-01), Letavic et al.
patent: 6133607 (2000-10-01), Funaki et al.
patent: 6184555 (2001-02-01), Tihanyi et al.
patent: 6191447 (2001-02-01), Baliga
patent: 6194283 (2001-02-01), Gardner et al.
patent: 6207994 (2001-03-01), Rumennik et al.
patent: 6294818 (2001-09-01), Fujihira
patent: 6316807 (2001-11-01), Fujishima et al.
patent: 6353252 (2002-03-01), Yasuhara et al.
patent: 6359308 (2002-03-01), Hijzen et al.
patent: 6362064 (2002-03-01), McGregor et al.
patent: 6365932 (2002-04-01), Kouno et al.
patent: 6388286 (2002-05-01), Baliga
patent: 6404009 (2002-06-01), Mori et al.
patent: 6462377 (2002-10-01), Hurky et al.
patent: 6468847 (2002-10-01), Disney
patent: 6507071 (2003-01-01), Tihanyi
patent: 6509220 (2003-01-01), Disney
patent: 6525372 (2003-02-01), Baliga
patent: 6555873 (2003-04-01), Disney et al.
patent: 6573558 (2003-06-01), Disney
patent: 6630698 (2003-10-01), Deboy
patent: 6635544 (2003-10-01), Disney
patent: 6667213 (2003-12-01), Disney
patent: 6677641 (2004-01-01), Kocon
patent: 6683346 (2004-01-01), Zeng
patent: 6734714 (2004-05-01), Disney
patent: 6764889 (2004-07-01), Baliga
patent: 6781194 (2004-08-01), Baliga
patent: 6781198 (2004-08-01), Disney
patent: 6787847 (2004-09-01), Disney et al.
patent: 6787848 (2004-09-01), Ono et al.
patent: 6809354 (2004-10-01), Okada et al.
patent: 6825536 (2004-11-01), Disney
patent: 6838346 (2005-01-01), Disney
patent: 6865093 (2005-03-01), Disney
patent: 6882005 (2005-04-01), Disney et al.
patent: 6987299 (2006-01-01), Disney et al.
patent: 7115958 (2006-10-01), Disney et al.
patent: 7135748 (2006-11-01), Balakrishnan
patent: 7335944 (2008-02-01), Banerjee
patent: 2001/0015459 (2001-08-01), Watanabe et al.
patent: 2002/0056884 (2002-05-01), Baliga
patent: 2002/0175351 (2002-11-01), Baliga
patent: 2003/0209757 (2003-11-01), Henniger et al.
patent: 1469487 (2004-01-01), None
patent: 0308612 (1989-03-01), None
patent: 1073 123 (2001-01-01), None
patent: 2 309 336 (1997-07-01), None
patent: 56-38867 (1981-04-01), None
patent: 57-10975 (1982-01-01), None
patent: 57-12557 (1982-01-01), None
patent: 57-12558 (1982-01-01), None
patent: 60-64471 (1985-04-01), None
patent: 1-238037 (1989-09-01), None
patent: 3-211771 (1991-09-01), None
patent: 04-107867 (1992-04-01), None
patent: 4107877 (1992-04-01), None
patent: 6-120510 (1994-04-01), None
patent: 6-196630 (1994-06-01), None
patent: 6-224426 (1994-08-01), None
patent: 9-266311 (1997-10-01), None
patent: 2000-12854 (2000-01-01), None
patent: 2000-349288 (2000-12-01), None
patent: 2001-085688 (2001-03-01), None
patent: 2002-43562 (2002-02-01), None
patent: WO 97/35346 (1997-09-01), None
patent: WO 99/34449 (1999-07-01), None
patent: WO 00/33385 (2000-06-01), None
patent: WO 02/41402 (2002-05-01), None
patent: WO 02/099909 (2002-12-01), None
“High Voltage Thin Layer Devices (RESURF Devices),” J.A. Apples, IEDM Tech Digest, Dec. 3-4-5, 1979, pp. 238-241.
“Realization of High Breakdown Voltage (>700V) in Thin SOI Devices,” S. Merchant, et al, Phillips Laboratories North America, 1991 IEEE, pp. 31-35.
“Theory of Semiconductor Superjunction Devices,” Tatsuhiko Fujihira, Japan Journal of Applied Physics vol. 36, Oct. 1997, pp. 6254-6262.
“Air-Gap Formation During IMD Deposition to Lower Interconnect Capacitance,” B. Shieh et al, IEEE Electron Device Letters vol. 19 No. 1, Jan. 1998, pp. 16-18.
Oxide-Bypassed VDMOS (OBVDMOS): An Alternative to Superjunction High-Voltage MOS Power Devices, Yung C. Liang et al, IEEE Electron Devices Letters, vol. 22, No. 8, Aug. 8, 2001, pp. 407-409.
“Comparison of High-Voltage Devices for Power Integrated Circuits,” R. Jayaraman et al, IEDM 84, pp. 258-261, 1984.
“A New Generation of High-Voltage MOSFETs Breaks the Limit Line of Silicon,” DeBoy et al. Siemens AG, Munchen, Germany, IEDM 98 pp. 683-685.
“High Performance 600V Smart Power Technology Based on Thin Layer Silicon-on-Insulators,” T. Letavic, et al, Phillips Research, 4 pages, date unknown.
“Modern Semiconductor Device Physics,” Sze, et al, John Wiley & Sons, Chapter 4 (“Power Devices”), 1998, pp. 203-206.
“Modeling and Optimisation of Lateral High Voltage IC Devices to Minimize 3-D Effects,” Ham

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High-voltage vertical transistor with a multi-gradient drain... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High-voltage vertical transistor with a multi-gradient drain..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High-voltage vertical transistor with a multi-gradient drain... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4051886

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.