Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2007-08-28
2007-08-28
Kebede, Brook (Department: 2823)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S241000, C438S396000, C257SE21008, C257SE21653
Reexamination Certificate
active
11326243
ABSTRACT:
A high-voltage stacked capacitor includes a first capacitor and a second capacitor. Each capacitor includes a first plate having a first semiconductive body and a second plate having a floating electrode. The first and second semiconductive bodies are electrically isolated from each other. The floating electrode includes an intercapacitor node configured to self-adjust to a value less than a working voltage impressed on the stacked capacitor.
REFERENCES:
patent: 6124163 (2000-09-01), Shirley et al.
patent: 6157054 (2000-12-01), Caser et al.
patent: 6222245 (2001-04-01), Bez et al.
patent: 7042701 (2006-05-01), Diorio et al.
Bernard Frederic J.
Diorio Christopher J.
Impinj, Inc.
Kebede Brook
Merchant & Gould
Turk Carl K.
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