High temperature resistive heater for a process chamber

Details High temperature resistive heater for a process chamber High temperature resistive heater for a process chamber

1996-09-23

2000-05-23

Walberg, Teresa

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

392416, 392418, 432253, 118725, F27B 514, C23C 1600

Patent

active

060668369

ABSTRACT:
A resistive heating structure for a processing apparatus such as a chemical vapor deposition chamber. The system includes a resistive heating substrate holder including a support surface and a support shaft, the holder being comprised of a first material. The support surface includes a resistive heating element. The support shaft has a given length, and through bores for allowing a thermocouple to engage the support surface and electrical conductors to couple to the resistive heating element in the support surface. A metallic mounting structure is coupled to the support shaft and secured to the process apparatus to create a sealed environment within the holder and mounting structure to protect the electrical leads and thermocouple from the process environment.

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