High speed pattern inspection method and system

Details High speed pattern inspection method and system High speed pattern inspection method and system

1997-05-29

1999-05-04

Font, Frank G.

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

356376, 356237, G01B 1100

Patent

active

059009411

ABSTRACT:
A pattern inspection method includes the steps of: copying design data representative of a design pattern in a storage unit; generating index data and storing the index data in the storage unit, the index data indicating data at what position of the design pattern is stored at which location of the storage unit; picking up an image of a real pattern on a stage and generating real pattern data; reading the design data by using the index data in accordance with a position on the real pattern; generating design pattern data in accordance with the read design data; and comparing the real pattern data with the design pattern data to detect any defect in the real pattern data. A pattern inspection method and system is provided which can perform die-to-database inspection at high speed.

REFERENCES:
patent: 4347001 (1982-08-01), Levy et al.
patent: 4532650 (1985-07-01), Wihl et al.
patent: 4555798 (1985-11-01), Broadbent, Jr. et al.
patent: 4805123 (1989-02-01), Specht et al.

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