High sensitivity, photo-active polymer and developers for high r

Details High sensitivity, photo-active polymer and developers for high r High sensitivity, photo-active polymer and developers for high r

1998-10-27

2000-08-08

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430326, 430967, G03F 732, G03F 738

Patent

active

061000116

ABSTRACT:
Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam a polymer having pendant recurring groups selected from the group consisting of

REFERENCES:
patent: 4296193 (1981-10-01), Moriya et al.
patent: 4657845 (1987-04-01), Frechet et al.
patent: 4814243 (1989-03-01), Ziger
patent: 5225316 (1993-07-01), Vogel et al.

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