High sensitivity, photo-active polymer and developers for high r

Details High sensitivity, photo-active polymer and developers for high r High sensitivity, photo-active polymer and developers for high r

1996-09-23

1999-09-21

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430326, 430967, G03F 730

Patent

active

059552425

ABSTRACT:
Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam a polymer having pendant recurring groups selected from the group consisting of

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