Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1984-05-11
1985-10-22
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430270, 430311, 430313, 430322, 430323, 430325, 430329, 430967, G03F 710, G03G 516
Patent
active
045488932
ABSTRACT:
A negative working resist composition and medium for microlithographic recording comprises a vinyl polymer having aromatic quaternized nitrogen-containing pendant groups. The resist undergoes a transformation from high to low solubility in polar solvents such as water or low molecular weight alcohols upon exposure to electron beams, ultraviolet light, or X-rays. A method for patterning substrates by employing the resist composition is also disclosed.
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Cukor Peter
Jensen William
Lee Kang I.
Dees Jos,e G.
Finnegan Martha Ann
GTE Laboratories Incorporated
Kittle John E.
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