Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1990-06-26
1992-03-10
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430189, 430313, 430314, 430323, 430324, 430326, 430643, 430190, 430193, 34 22, G03F 736
Patent
active
050949365
ABSTRACT:
A process for silylation of positive or negative photosensitive resist layer on a semiconductor wafer after the resist layer has been exposed to radiant energy through a mask which includes introducing a silylating agent to the wafer at high pressure over 760 torr and, usually, at temperatures less than 180.degree. C. Increased pressure increases the rate of silylation, allows practical use of lower process temperatures, and, therefore, allows better process control. Also an apparatus is disclosed for applying the high pressure silylation process to a wafer.
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Davis Cecil J.
Garza Cesar M.
Misium George R.
Bowers Jr. Charles L.
Honeycutt Gary C.
Merrett N. Rhys
Pezzner Ashley I.
Sharp Melvin
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