High performance GaAs field effect transistor structure

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having schottky gate

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

438267, 438571, 438572, 438172, 438180, 438181, 438176, 438597, 438576, 438604, 438606, H01L 2128, H01L 213205, H01L 2144

Patent

active

060837829

ABSTRACT:
An improved GaAs MESFET includes a source contact ohmically coupled to a buffer layer or substrate to stabilize band bending at the interface of the active layer and buffer layer or substrate when an RF signal is applied to a gate electrode.

REFERENCES:
patent: 3986196 (1976-10-01), Decker et al.
patent: 4196439 (1980-04-01), Niehaus et al.
patent: 4499656 (1985-02-01), Fabian et al.
patent: 4777516 (1988-10-01), Deschler et al.
patent: 4888626 (1989-12-01), Davey
patent: 4981807 (1991-01-01), Jambotkar
patent: 5153682 (1992-10-01), Goto et al.
patent: 5268315 (1993-12-01), Prasad et al.
patent: 5369288 (1994-11-01), Usuki
patent: 5698875 (1997-12-01), Varmazis
patent: 5742082 (1998-04-01), Tehrani et al.
patent: 5912480 (1999-06-01), Zhu et al.
patent: 6008509 (1999-12-01), Inai et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High performance GaAs field effect transistor structure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High performance GaAs field effect transistor structure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High performance GaAs field effect transistor structure will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1485549

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.