Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1996-11-22
1998-12-15
Dang, Thi
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
31511121, 118723E, H05H 100
Patent
active
058491368
ABSTRACT:
A plasma process apparatus capable of operation significantly above 13.56 MHz can produce reduced self-bias voltage of the powered electrode to enable softer processes that do not damage thin layers that are increasingly becoming common in high speed and high density integrated circuits. A nonconventional match network is used to enable elimination of reflections at these higher frequencies. Automatic control of match network components enables the rf frequency to be adjusted to ignite the plasma and then to operate at a variable frequency selected to minimize process time without significant damage to the integrated circuit.
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Collins Kenneth S.
Hanawa Hiroji
Maydan Dan
Mintz Donald M.
Somekh Sasson
Applied Materials Inc.
Dang Thi
Morris Birgit E.
Verplancken Donald
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