4. Etching a substrate: processes
  5. Gas phase etching of substrate
  6. Application of energy to the gaseous etchant or to the...

Shimao Yoneyama

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

High frequency plasma process wherein the plasma is executed by

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Process depending on plasma discharges sustained by...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With radio frequency antenna or inductive coil gas...
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Shimao Yoneyama does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Shimao Yoneyama, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Shimao Yoneyama will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-870558

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure