High contrast optical marking method for polished surfaces

Details High contrast optical marking method for polished surfaces High contrast optical marking method for polished surfaces

1987-09-09

1989-07-11

Robinson, Ellis P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430296, 430323, 430325, 430326, 430328, 430394, 430494, 430942, G03C 500

Patent

active

048471836

ABSTRACT:
Indicia, provided on a specularly reflective surface, are formed by a dot surface relief pattern featuring polygonal surfaces spaced apart to enhance scattering. The spacing of dots is characterized by a pitch in the range of 8 to 50 microns with a dot size of less than 50 microns and usually about one-half of the pitch dimension. In one embodiment, the dots may be anisotropically etched forming mesas, enhanced by gemlike polygonal facets which provide good optical contrast relative to the background surface.

REFERENCES:
patent: 3598604 (1968-11-01), De Puy
patent: 3874916 (1975-04-01), Livesay et al.
patent: 4229520 (1980-11-01), Bratt et al.
patent: 4344816 (1982-04-01), Craighead et al.
patent: 4368245 (1983-01-01), Bayer
patent: 4403151 (1983-09-01), Mochiji et al.
patent: 4426247 (1984-01-01), Tamamura et al.
patent: 4591540 (1986-05-01), Bohlen et al.
patent: 4594263 (1986-06-01), Folk et al.
patent: 4610940 (1986-09-01), Araihara
patent: 4614706 (1986-09-01), Matsuzawa et al.
patent: 4650744 (1987-03-01), Amano
patent: 4690880 (1987-09-01), Suzuki et al.

Affiliated with

Also associated with

Rating

High contrast optical marking method for polished surfaces does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High contrast optical marking method for polished surfaces, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High contrast optical marking method for polished surfaces will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-436841