Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1992-05-21
1993-05-04
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430165, 430192, 430193, G03F 732, G03F 7023
Patent
active
052081389
ABSTRACT:
Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and (1) a monohydroxy aromatic aldehyde and wherein at least a portion of the hydroxyl groups thereof are esterified or (2) a mixture of at least one monohydroxy aromatic aldehyde and at least one non-hydroxylic aromatic aldehyde; the novolak resins having a hydroxyl number of from about 120 to about 180 grams of resin per equivalent of hydroxyl. The novolak resins are especially useful in positive photoresist formulations and have enhanced photospeed and film loss characteristics as well as improved thermal stability.
REFERENCES:
patent: 4308368 (1981-12-01), Kubo et al.
patent: 4564575 (1986-01-01), Perreault et al.
patent: 4681923 (1987-07-01), Demmer et al.
patent: 4725523 (1988-02-01), Miura et al.
patent: 4920028 (1990-04-01), Lazarus et al.
patent: 4943511 (1990-07-01), Lazarus et al.
patent: 4971887 (1990-11-01), Schmitt et al.
patent: 4980264 (1990-12-01), Chiong et al.
patent: 4983492 (1991-01-01), Trefonas, III et al.
patent: 4996122 (1991-02-01), Lazarus et al.
patent: 4997734 (1991-03-01), Lazarus et al.
patent: 5019479 (1991-05-01), Oka et al.
Dixit Sunit S.
Kautz Randall
Lazarus Richard M.
Bowers Jr. Charles L.
Chu John S.
Didrick Robert M.
Morton International Inc.
Rauchfuss, Jr. George W.
LandOfFree
High contrast high thermal stability positive photoresists havin does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with High contrast high thermal stability positive photoresists havin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High contrast high thermal stability positive photoresists havin will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1974686