High-capacitance density thin film dielectrics having...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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C438S393000, C257S310000, C257SE21008

Reexamination Certificate

active

07981741

ABSTRACT:
Deposited thin-film dielectrics having columnar grains and high dielectric constants are formed on heat treated and polished metal foil. The sputtered dielectrics are annealed at low oxygen partial pressures.

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