Heater for CVD apparatus

Details Heater for CVD apparatus Heater for CVD apparatus

1996-04-19

1998-06-16

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118728, C23C 1600

Patent

active

057663637

ABSTRACT:
A heater is used in a CVD apparatus. In the CVD apparatus, reactive gas is supplied through a reactive gas supply plate to a substrate on a substrate holder to deposit a film on the substrate, and a purge gas supply passage is formed by placing a shield mechanism around the substrate holder, the shield mechanism including a ring plate disposed close to the outer periphery of the substrate. During film deposition, purge gas supplied through the purge gas supply passage is blown off from a clearance between the substrate and the ring plate, thereby preventing a film from being deposited on the rear surface of the substrate or the like. A heating element is arranged in a space in the purge gas supply passage close to but not contacting the substrate holder. The heating element is preferably a ceramic heater.

REFERENCES:
patent: 4854263 (1989-08-01), Chang
patent: 5094885 (1992-03-01), Selbrede
patent: 5294778 (1994-03-01), Carman
patent: 5343022 (1994-08-01), Gilbert
patent: 5344492 (1994-09-01), Sato
patent: 5445677 (1995-08-01), Kawata
patent: 5462603 (1995-10-01), Murakami
patent: 5476548 (1995-12-01), Lei
Shin-Etsu Chemical Co., Ltd., "PBN/PG Ceramic Heaters"

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