Heated gas distribution plate for a processing chamber

Details Heated gas distribution plate for a processing chamber Heated gas distribution plate for a processing chamber

2005-09-20

2005-09-20

Zervigon, Rudy (Department: 1763)

Coating apparatus

Gas or vapor deposition

C118S722000, C118S724000, C156S345290, C156S345330, C156S345340

Reexamination Certificate

active

06946033

ABSTRACT:
An apparatus for distributing gas in a processing system. In one embodiment, the system includes a gas distribution assembly having a gas distribution plate. The gas distribution plate defines a plurality of holes through which gases are transmitted. The assembly further includes a gas box coupled to the gas distribution plate, in which the gas box is configured to supply the gases into the plurality of holes. The assembly further includes a means for reducing heat transfer from the gas box to the gas distribution plate.

REFERENCES:
patent: 4539933 (1985-09-01), Campbell et al.
patent: 4545327 (1985-10-01), Campbell et al.
patent: 4641603 (1987-02-01), Miyazaki et al.
patent: 4792378 (1988-12-01), Rose et al.
patent: 4803948 (1989-02-01), Nakagawa et al.
patent: 4872947 (1989-10-01), Wang et al.
patent: 5000113 (1991-03-01), Wang et al.
patent: 5071485 (1991-12-01), Matthews et al.
patent: 5074456 (1991-12-01), Degner et al.
patent: 5108792 (1992-04-01), Anderson et al.
patent: 5155336 (1992-10-01), Gronet et al.
patent: 5200232 (1993-04-01), Tappan et al.
patent: 5275977 (1994-01-01), Otsubo et al.
patent: 5328515 (1994-07-01), Chouan et al.
patent: 5344492 (1994-09-01), Sato et al.
patent: 5357715 (1994-10-01), Hiramatsu
patent: 5445709 (1995-08-01), Kojima et al.
patent: 5584971 (1996-12-01), Komino
patent: 5595606 (1997-01-01), Fujikawa et al.
patent: 5632820 (1997-05-01), Taniyama et al.
patent: 5647945 (1997-07-01), Matsuse et al.
patent: 5653806 (1997-08-01), Van Buskirk
patent: 5665166 (1997-09-01), Deguchi et al.
patent: 5766364 (1998-06-01), Ishida et al.
patent: 5781693 (1998-07-01), Ballance et al.
patent: 5835334 (1998-11-01), McMillin et al.
patent: 5846375 (1998-12-01), Gilchrist et al.
patent: 5882411 (1999-03-01), Zhao et al.
patent: 5885356 (1999-03-01), Zhao et al.
patent: 5906683 (1999-05-01), Chen et al.
patent: 5950925 (1999-09-01), Fukunaga et al.
patent: 5953827 (1999-09-01), Or et al.
patent: 5994678 (1999-11-01), Zhao et al.
patent: 6035101 (2000-03-01), Sajoto et al.
patent: 6072163 (2000-06-01), Armstrong et al.
patent: 6086677 (2000-07-01), Umotoy et al.
patent: 6091060 (2000-07-01), Getchel et al.
patent: 6110556 (2000-08-01), Bang et al.
patent: 6117245 (2000-09-01), Mandrekar et al.
patent: 6148761 (2000-11-01), Majewski et al.
patent: 6302964 (2001-10-01), Umotoy et al.
patent: 6348725 (2002-02-01), Cheung et al.
patent: 6364954 (2002-04-01), Umotoy et al.
patent: 6379466 (2002-04-01), Sahin et al.
patent: 6433314 (2002-08-01), Mandrekar et al.
patent: 6461435 (2002-10-01), Littau et al.
patent: 6477980 (2002-11-01), White et al.
patent: 6537420 (2003-03-01), Rose
patent: 2002/0016085 (2002-02-01), Huang et al.
patent: 2002/0078893 (2002-06-01), Os et al.
patent: 2002/0084257 (2002-07-01), Bjorkman et al.
patent: 0 441 710 (1991-08-01), None
patent: 0 477 453 (1992-04-01), None
patent: 06142173 (1994-06-01), None
patent: 0 714 998 (1995-11-01), None
patent: 08187212 (1996-07-01), None
patent: 0 776 988 (1997-06-01), None
patent: 326587 (1994-06-01), None

Affiliated with

Also associated with

Rating

Heated gas distribution plate for a processing chamber does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Heated gas distribution plate for a processing chamber, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Heated gas distribution plate for a processing chamber will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3430699